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- E-mail : sales@crylight.com
- Website:www.crylight.com
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Professional in producing high precision optics and optical imaging lenses since 2005.
Capabilities:
Aperture: 1-15 x 2-15mm
Lenght: 2 - 50mm
Cutting Angle q and f: Determined by different kinds of homonic generartion
Phase matching type: Type I or Type II
Product Features
LiNbO3(Lithium Niobate) crystal has high mechanical and chemical stability, good physical properties, wide transparency range as well as high optical homogeneity. LiNbO3 crystal is widely used as frequency doublers for wavelength > 1mm and optical parametric oscillators (OPOs) pumped at 1064 nm.
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Due to its large electro-optic and acousto-optic coefficiens, LiNbO3 crystal is the most commonly used material for Pockels Cells, Q-switches and phase modulators, aveguide substrate, and surface acoustic wave(SAW) wafers, etc. High quality and large size LiNbO3 crystals, waveguide substrate and SAW wafers are available.
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MgO:LiNbO3 (Magnesium Oxide Doped Lithium Niobate) crystal has similar effective nonlinear coefficients to pure LiNbO3 and exhibits higher optical damage threshold.
Specifications: | |
Angle tolerance: | Δθ< ± 0.5°; Δφ< ±0.5° |
Dimensional Tolerance: | (W ± 0.1mm) x (H ± 0.1mm) x (L + 0.2mm/-0.1mm) |
Flatness: | <λ/8 at 633nm |
Surface Quality: | 20/10 Scracth/Dig |
Parallelism: | < 20 arc seconds |
Perpendicularity: | < 5 arc minutes |
Wavefront Distortion: | <λ/8 at 633nm |
Clear Aperture: | Central 95% |
Chamfer: | 0.15x45° |
Coating: | * AR @ wavelegth specified by customer |
Properties: | |
Crystal Structure | Trigonal, space group R3c |
Cell Parameters | a = 0.515, c = 13.863, Z = 6 |
Melting Point | 1255 +/-5℃ |
Curie Point | 1140 +/-5℃ |
Mohs Hardness | 5 |
Density | 4.64 g/cm3 |
Absorption Coefficient | ~ 0.1%/cm @ 1064 nm |
Solubility: | insoluble in H2O |
Relative Dielectric Constant | eT11/e0: 85 |
eT33/e0: 29.5 | |
Thermal Expansion Coefficients at 25℃ | ||a, 2.0 x 10-6/K @ 25℃ |
||c, 2.2 x 10-6/K @ 25℃ | |
Thermal Conductivity | 38 W /m /K @ 25℃ |
Transparency Range | 420 - 5200 nm |
Refractive Indices | ne = 2.146, no = 2.220 @ 1300 nm |
ne = 2.156, no = 2.322 @ 1064 nm | |
ne = 2.203, no = 2.286 @ 632.8 m | |
Optical Homogeneity | ~ 5 x 10-5 /cm |
Sellmeier Equations( l in mm) | no2(λ) = 4.9048+0.11768/(λ2 - 0.04750) - 0.027169 λ2 |
ne2(λ) = 4.5820+0.099169/(λ2- 0.04443) - 0.021950 λ2 | |
NLO Coefficients | d33 = 34.4 pm/V |
d31 = d15 = 5.95 pm/V | |
d22 = 3.07 pm/V | |
Electro-Optic Coefficients | γT33 = 32 pm/V, γS33 = 31 pm/V |
γT31 = 10 pm/V, γS31 = 8.6 pm/V | |
γT22 = 6.8 pm/V, γS22 = 3.4 pm/V, | |
Half-Wave Voltage, DC | 3.03 KV 4.02 KV |
Electrical field ||z, light ^ z | |
Electrical field ||x or y, light || z | |
Damage Threshold | 200 MW/cm2 (10 ns) |
Efficiency NLO Coefficients | deff=5.7pm/V or~14.6xd36(KDP) for frequency doubling 1300 nm; |
deff=5.3pm/V or~13.6xd36(KDP) for OPO pumped at 1300nm; | |
deff=17.6pm/V or~45xd36(KDP) for quasi-phase-matched structure; | |
MgO:LiNbO3 | |
Specification: | |
Dimensional Tolerance: | (W ± 0.1mm) x (H ± 0.1mm) x (L + 0.2mm/-0.1mm) |
Flatness: | <λ/8 at 633nm |
Surface Quality: | 20/10 Scracth/Dig |
Parallelism: | < 20 arc seconds |
Perpendicularity: | < 5 arc minutes |
Wavefront Distortion: | <λ/8 at 633nm |
Clear Aperture: | Central 95% |
Chamfer: | 0.15x45° |
Coating: | * AR @ wavelegth specified by customer |
Sellmeier Equations: no2(l) = 4.8762 + 0.11554/(l2 - 0.04674) - 0.033119 x l2/(l in mm) no2(l) = 4.5469 + 0.094779/(l2 - 0.044394) - 0.026721 x l2 |
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